Apr 2, 2008
Chartered Extends Technology Development Collaboration with IBM to 22-Nanometer Process Node
“Going forward, it will be material science invention that will improve silicon performance while the collaborative model mitigates the escalating cost of technology and design and improves time to manufacture.”
Chartered Semiconductor Manufacturing today announced the extension of its joint development collaboration with IBM to include 22-nanometer bulk complementary metal oxide semiconductor technology. via Design And Reuse
Comments
Please note by clicking on "Post Comment" you acknowledge that you have read the Terms of Service and the comment you are posting is in compliance with such terms. Be polite. Inappropriate posts may be removed by the moderator. Send us your feedback.
